Vapour permeation and membrane distillation are two emerging membrane technologies for the production of vapour as permeate, which, in addition to well-established pervaporation technology, are of increasing interest to academia and industry. As efficient separation and concentration processes, they have high potential for use in the energy, water, chemical, food and pharmaceutical sectors.
Part One begins by covering the fundamentals, preparation and characterization of pervaporation, before going on to outline the associated systems and applications. State of the art uses, future trends and next generation pervaporation are then discussed. Part Two then explores the preparation, characterization, systems and applications of membranes for vapour permeation, followed by modelling and the new generation of vapour permeation membranes. Finally, Part Three outlines the fundamentals of membrane distillation and its applications in integrated systems, before the book concludes with a view of the next generation.
This book provides an important link between the theoretical knowledge in the field of non-linier physics and practical application problems in microelectronics. It delivers different levels of understanding of the physical phenomena that play a critical role in limitation of the semiconductor device capabilities, physical safe operating area limitation, and different scenarios of catastrophic failures in semiconductor devices. The book focuses on power semiconductor devices and self-triggering pulsed power devices for ESD protection clamps. The purpose of the book is popularization of the physical approach for reliability assurance. Another unique aspect of the book is the role of local structural defects, their mathematical description, and their impact on the reliability of the semiconductor devices.
One of the major challenges the book covers is the gap in understanding of major physical regularities between the theoretical knowledge in the field of non-linier phenomena in semiconductors and the reliability and ESD protection problems in process and device development, circuit design, TCAD, and applications.
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